Emerging yield and reliability challenges in nanometer CMOS technologies
作者： G. Gielen , P. De Wit , E. Maricau , J. Loeckx , J. Martín-Martínez
关键词:
摘要: … Solutions to the EMC problem can be found in the use of EMC analysis software [26] in order to reduce the susceptibility of a circuit to electromagnetic interference. Also, special EMC-…
acm.org
core.ac.uk
sci-hub.se 
researchgate.net 参考文章(46)
J.A. Croon, G. Storms, S. Winkelmeier, I. Pollentier, M. Ercken, S. Decoutere, W. Sansen, H.E. Maes, Line edge roughness: characterization, modeling and impact on device behavior international electron devices meeting. pp. 307- 310 ,(2002) , 10.1109/IEDM.2002.1175840
H. Tuinhout, Impact of Parametric Fluctuations on Performance and Yield of Deep-Submicron Technologies 32nd European Solid-State Device Research Conference. pp. 95- 102 ,(2002) , 10.1109/ESSDERC.2002.194879
J.H. Stathis, Physical and predictive models of ultra thin oxide reliability in CMOS devices and circuits international reliability physics symposium. pp. 132- 149 ,(2001) , 10.1109/RELPHY.2001.922893
Mohamed Ramdani, Etienne Sicard, Sonia Ben Dhia, Johan Catrysse, Towards an EMC roadmap for Integrated Circuits international symposium on electromagnetic compatibility. pp. 8- 11 ,(2008) , 10.1109/APEMC.2008.4559798
A.S. Poulton, Effect of conducted EMI on the DC performance of operational amplifiers Electronics Letters. ,vol. 30, pp. 282- 284 ,(1994) , 10.1049/EL:19940195
B. Kaczer, R. Degraeve, M. Rasras, A. De Keersgieter, K. Van de Mieroop, G. Groeseneken, Analysis and modeling of a digital CMOS circuit operation and reliability after gate oxide breakdown: a case study Microelectronics Reliability. ,vol. 42, pp. 555- 564 ,(2002) , 10.1016/S0026-2714(02)00026-4
J.R. Black, Electromigration—A brief survey and some recent results IEEE Transactions on Electron Devices. ,vol. 16, pp. 338- 347 ,(1969) , 10.1109/T-ED.1969.16754
J. Loeckx, G. Gielen, Efficient identification of major contributions to EMI-induced rectification effects in analog automotive circuits international symposium on electromagnetic compatibility. pp. 148- 151 ,(2006) , 10.1109/EMCZUR.2006.214891
Van Hieu Nguyen, H Nguyen, Cora Salm, R Wenzel, AJ Mouthaan, FG Kuper, Simulation and experimental characterization of reservoir and via layout effects on electromigration lifetime Microelectronics Reliability. ,vol. 42, pp. 1421- 1425 ,(2002) , 10.1016/S0026-2714(02)00162-2
J. Martín-Martínez, S. Gerardin, R. Rodríguez, M. Nafría, X. Aymerich, A. Cester, A. Paccagnella, G. Ghidini, Lifetime estimation of analog circuits from the electrical characteristics of stressed MOSFETs Microelectronics Reliability. ,vol. 47, pp. 1349- 1352 ,(2007) , 10.1016/J.MICROREL.2007.07.088