Method for forming a coating on an electronic or electrical device

摘要: An electronic or electrical device component thereof having a coating formed thereon by exposing said to plasma comprising one more monomer compounds for sufficient period of time allow protective polymeric form on surface thereof;wherein the forms physical barrier over thereof; wherein each is compound formula I(a): I(a) I(b) R 1 9 independently selected from hydrogen halogen an optionally substituted C -C 6 branched straight chain alkyl group; X halogen; 0-6; b 2 14; and c 0 1;and when F at least halogen, in particular F, FTIR/ATR intensity ratio CX 3 /C=O less than (c+1)0.6e -0.1n where n a+b+c+1;and H (c+1) 0.25±0.02, conformal barrier.