Method and system for establishing a common reference point on a semiconductor wafer inspected by two or more scanning mechanisms

作者: Arnold Cheng , Chin-Jung Hsu , James Ni

DOI:

关键词:

摘要: A method and system for establishing a common reference point on semiconductor wafer inspected by two or more scanning mechanisms. The includes plurality of dies identical size, each die being generally rectangularly shaped having four corners. Adjacent are separated street, the sum width street equaling period. with first mechanism to establish coordinate wafer. determines be center which is assigned value relative system. location in calculated as corner within half period from value, second then scanned establishes located can

参考文章(7)
Charly Dany Allemand, Particle detection method and apparatus ,(1992)
Yuri S. Uritsky, Patrick D. Kinney, Harry Q. Lee, Multiple-scan method for wafer particle analysis ,(1994)
Yuri S. Uritsky, Patrick D. Kinney, Harry Q. Lee, Kang-Ho Ahn, Method of particle analysis on a mirror wafer ,(1992)
Takaoki Namba, Masaaki Kubota, Soichi Yamamoto, Method of generating die structure data ,(1996)