Nanomechanical and nanotribological properties of carbon based films
作者： C. Charitidis , S. Logothetidis
DOI: 10.1016/J.TSF.2004.11.129
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摘要: Abstract Submicrometer-thick hard amorphous carbon (a-C) and nitride (CN x ) films were deposited on Si stainless steel (SS) substrates by rf magnetron sputtering (MS) reactive MS, respectively. a-C synthesized either alternating ultrathin layers of soft or using a Cr interlayer between SS substrate. The main purpose this work is to investigate compare the nanomechanical, adhesion nanotribological properties CN films. Hardness ( H elastic modulus E obtained from indentation experiments performed with nanoindenter continuous stiffness method. was found be equal ∼25 GPa, corresponding values single-layer ∼12 GPa. Nanoscratch tests Nano Indenter XP system lateral force measuring attachment. Ultralow load scratch in range 2 20 mN. Below 5 mN, nanoscratching showed mainly behavior films, while above 10 mixed elastic-plastic identified. Testing under normal mN resulted local grooving at film surface; however, situ profiling trace no evidence failure. coefficient friction vary 0.15–0.3, being lower for higher properties, permanent damage recovery same imply that grown both sustain scratch-induced stresses can more effective as protective coating material.
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