Method for exposing a wafer
作者： Marco Jan-Jaco Wieland , Teunis Van De Peut
DOI:
关键词:
摘要: A method for exposing a wafer according to pattern data using charged particle lithography machine generating plurality of beamlets the wafer. The comprises providing in vector format, rendering generate multi-level data, dithering two-level supplying machine, and switching on off generated by basis wherein is adjusted corrective data.
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