Interaction of Ni/Al Interfaces with Oxygen

作者: A. Arranz , C. Palacio

DOI: 10.1021/LA015634D

关键词:

摘要: The interaction of oxygen with nickel deposited on polycrystalline aluminum surfaces has been investigated using Auger electron spectroscopy, X-ray photoelectron and angle-resolved spectroscopy. growth the occurs in two stages:  formation NiAlx (x ≈ 0.45) islands 10 monolayers (ML) thick up to a coverage θNiAlx 0.7, followed by metallic 8 ML that grow over intermetallic previously formed. For containing alone, chemical information obtained analytical techniques shows exposure causes intermediate oxidation states Al+ Al2+, addition Al3+, which are attributed Al−O−Ni cross-linking bonds at interface. analysis Ni 2p peak shape no oxide is formed, small changes observed this band being atoms an aluminum-depleted layer ...

参考文章(44)
V. Shutthanandan, Adli A. Saleh, R. J. Smith, Room temperature reaction of thin Ni films with Al(110) surfaces Journal of Vacuum Science and Technology. ,vol. 11, pp. 1780- 1785 ,(1993) , 10.1116/1.578425
Kosaku Kishi, Yoshinobu Hayakawa, Katsuya Fujiwara, Preparation of ultrathin nickel oxide on ordered vanadium oxide films grown on Cu(100) surface studied by LEED and XPS Surface Science. ,vol. 356, pp. 171- 180 ,(1996) , 10.1016/0039-6028(96)00015-5
D. Alders, F. C. Voogt, T. Hibma, G. A. Sawatzky, Nonlocal screening effects in 2p x-ray photoemission spectroscopy of NiO (100). Physical Review B. ,vol. 54, pp. 7716- 7719 ,(1996) , 10.1103/PHYSREVB.54.7716
N. S. McIntyre, M. G. Cook, X-ray photoelectron studies on some oxides and hydroxides of cobalt, nickel, and copper Analytical Chemistry. ,vol. 47, pp. 2208- 2213 ,(1975) , 10.1021/AC60363A034
Q. Zhong, F. S. Ohuchi, Surface science studies on the Ni/Al2O3 interface Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 8, pp. 2107- 2112 ,(1990) , 10.1116/1.577011
E.W.A. Young, J.C. Rivière, L.S. Welch, The influence of the heating procedure on the oxidation behaviour of NiAl studied by XPS Applied Surface Science. ,vol. 31, pp. 370- 374 ,(1988) , 10.1016/0169-4332(88)90099-2
Massimo Tomellini, X-ray photoelectron spectra of defective nickel oxide Journal of the Chemical Society, Faraday Transactions 1: Physical Chemistry in Condensed Phases. ,vol. 84, pp. 3501- 3510 ,(1988) , 10.1039/F19888403501
E.W.A. Young, J.C. Rivière, L.S. Welch, Investigation by X-ray photoelectron spectroscopy of the transient oxidation of NiAl Applied Surface Science. ,vol. 28, pp. 71- 84 ,(1987) , 10.1016/0169-4332(87)90029-8