Multilayer interference mirrors for the XUV range around 100 eV photon energy
作者： R.-P. Haelbich , C. Kunz
DOI: 10.1016/0030-4018(76)90262-5
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摘要: Abstract For the first time successful results have been obtained demonstrating interference effects in reflectance of multilayer films at high photon energies where n = 1 and k is large. Films with 3.5 to 4.5 periods Au/C Cu/C were investigated for angles incidence α 15° 60° wavelength interval 80 300A˚. The highest near-normal found was R 2.7% 1.2% λ ∼ 190A˚and 15°. These values by a factor 7 higher than those single layered opaque Au film (respectively 6 Cu) evaporated under same conditions. Further improvements appear be possible. Calculations performed guide investigations help interpretation results.
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