Full three-dimensional morphology evolution of amorphous thin films for atomic layer deposition
作者： Lingpeng Jin , Yawei Li , Zhigao Hu , Junhao Chu
DOI: 10.1063/1.5025008
关键词:
摘要: We introduce a Monte Carlo model based on random deposition and diffusion limited aggregation in order to study the morphological evolution of nanofilm, which is difficult carry out by experimental methods. The instantaneous morphology corresponding parameters are observed when employing novel perspective, modeling nanoscale units. Despite simplifying chemical details, simulation results qualitatively describe experiments with bulky precursors, strong dependence growth rate steric hindrance obtained. Moreover, well know behavior that delay before steady accurately predicted analyzed solely modeling. Through this work, great influence initial stage ALD described.We described.
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