Controlled dewetting as fabrication and patterning strategy for metal nanostructures

摘要: Metal thin films and metal nanostructures find a key role in the actual nanotechnology revolution. They can be engineered for nanoelectronics, plasmonics, sensing applications. However, crucial step toward reliable technological applications of metal-based nanodevices is development simple, low cost, versatile, high-throughout nanofabrication methodologies. In general, top-down approaches allow minimum size single nanostructure higher than 10 nm, high control on spatial regularity nanostructures, but involve cost long processing time. contrast, bottom-up lower short this paper, controlled dewetting process surfaces reviewed as patterning method nanocomposites, crossing strenghts both approaches.