A calculation model for the evaporation recoil pressure in laser material processing
作者： Xi Chen , Hai-Xing Wang
DOI: 10.1088/0022-3727/34/17/310
关键词:
摘要: A physical model is proposed to calculate the recoil pressure acting on surface of an evaporating material irradiated by a high-intensity laser beam, such as encountered in processing. Laser attenuation laser-induced plasma plume, reflection at and energy consumption for heating melting are considered this model. This evaporation represents revised form that previously employed Chen Xi (1996, 1997, 1998) evaporation-added particle exposed thermal plasma, but here special features associated with processing considered. The calculated pressures compare favourably available experimental data.
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