Method of manufacturing semiconductor device and exposure device

作者: Masaru Suzuki

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摘要: A method of manufacturing a semiconductor device according to an embodiment includes acquiring focus values measured for regions having different reflectance respectively due films formed at lower location than resist above substrate, the including first value acquired region and second higher bringing closer value, carrying out exposure processing.

参考文章(2)
Masayuki Murayama, Tetsuo Taniguchi, Projection exposure apparatus and method ,(2004)