TiAlN∕TiAlON∕Si3N4 tandem absorber for high temperature solar selective applications
作者： Harish C. Barshilia , N. Selvakumar , K. S. Rajam , D. V. Sridhara Rao , K. Muraleedharan
DOI: 10.1063/1.2387897
关键词:
摘要: A tandem absorber of TiAlN∕TiAlON∕Si3N4 is prepared using a magnetron sputtering process. The graded composition the individual component layers produces film with refractive index increasing from surface to substrate, which exhibits high absorptance (0.95) and low emittance (0.07). stable in air up 600°C for 2h, indicating its importance temperature solar selective applications. thermal stability attributed oxidation resistance microstructural materials at higher temperatures.
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