Corrosion Protection of Copper by a Self‐Assembled Monolayer of Alkanethiol

摘要: A self-assembled monolayer of 1-dodecanethiol (DT) was formed on a copper surface pretreated using different methods. The corrosion protection abilities the were evaluated in an air-saturated 0.51 M NaCl solution various techniques including electrochemical impedance spectroscopy, polarization, coulometry, weight loss, and X-ray photoelectron spectroscopy. It found that resistance improved markedly by nitric acid etching method. minimum concentration 10{sup {minus}4} DT needed to form protective monolayer. DT-monolayer retarded reduction dissolved oxygen inhibited growth oxide solution. In comparison with other inhibitors, such as benzotriazole (BTA) mercapto-benzothiazole (MBT), showed much better aqueous