Structure of alumina oxide coatings deposited by impulse plasma method

作者: K. Zdunek , J. Mizera , P. Wiencek , W. Gebicki , M. Mozdzonek

DOI: 10.1016/S0040-6090(98)01594-6

关键词:

摘要: Abstract Al 2 O 3 coatings were produced by the LPD method with use of solid precursors aluminium oxide. The deposited on non-heated substrates and heated from an external heat source at various geometries substrate/impulse plasma stream arrangement. Depending technological variant employed, obtained composed metastable or stable monotropic phases. process parameters also affected morphology coatings. IR, RS XPS examinations atomic structure coatings, performed in present study earlier investigations, have shown that oxide impulse a nanocrystalline amorphous structure. phase composition can be modified heating substrate stationary way during IPD process, to temperature 500 K.

参考文章(9)
Krzysztof Zdunek, Synthesis of Al2O3 condensates from impulse plasma Surface & Coatings Technology. ,vol. 59, pp. 281- 286 ,(1993) , 10.1016/0257-8972(93)90097-8
K. Zdunek, Mechanism of crystallization of multicomponent metallic coatings using the impulse plasma method Journal of Materials Science. ,vol. 26, pp. 4433- 4438 ,(1991) , 10.1007/BF00543664
A.C. Dillon, A.W. Ott, J.D. Way, S.M. George, Surface chemistry of Al2O3 deposition using Al(CH3)3 and H2O in a binary reaction sequence Surface Science. ,vol. 322, pp. 230- 242 ,(1995) , 10.1016/0039-6028(95)90033-0
K. Zdunek, H. Grigoriew, Nanoporosity of Al2O3 coatings obtained by impulse plasma deposition Journal of Materials Science. ,vol. 30, pp. 4479- 4482 ,(1995) , 10.1007/BF00361534
Donald R. Messier, Philip Wong, Epitaxial Growth of Al[sub 2]O[sub 3] on Al[sub 2]O[sub 3] Substrates by Chemical Vapor Deposition Journal of The Electrochemical Society. ,vol. 118, pp. 772- 776 ,(1971) , 10.1149/1.2408162
J A Thornton, High Rate Thick Film Growth Annual Review of Materials Science. ,vol. 7, pp. 239- 260 ,(1977) , 10.1146/ANNUREV.MS.07.080177.001323