Industrial applications of plasma immersion ion implantation
作者： C. Blawert , B.L. Mordike
DOI: 10.1016/S0257-8972(97)00060-1
关键词:
摘要: Abstract Plasma immersion ion implantation (PI 3 ) is a new hybrid technology using elements of as well plasma nitriding. In addition, and due to the high energetic bombardment, thermal diffusion can be used obtain thicker layers than in conventional implantation. Furthermore, process an beam enchanced deposition (IBED) mode produce various kinds coatings. This enables treatment adapted material structure state also intended service conditions. economic aspects make PI interesting technique for surface modification wide range materials. An overview worldwide activities components achieved improvements will given.
elsevier.com
sci-hub.se 参考文章(57)
Shu Qin, Chung Chan, N E McGruer, Energy distribution of boron ions during plasma immersion ion implantation Plasma Sources Science and Technology. ,vol. 1, pp. 1- 6 ,(1992) , 10.1088/0963-0252/1/1/001
M. M. Shamim, J. T. Scheuer, R. P. Fetherston, J. R. Conrad, Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation Journal of Applied Physics. ,vol. 70, pp. 4756- 4759 ,(1991) , 10.1063/1.349067
J. T. Scheuer, M. Shamim, J. R. Conrad, Model of plasma source ion implantation in planar, cylindrical, and spherical geometries Journal of Applied Physics. ,vol. 67, pp. 1241- 1245 ,(1990) , 10.1063/1.345722
Jesse N. Matossian, Plasma ion implantation technology at Hughes Research Laboratories Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 12, pp. 850- 853 ,(1994) , 10.1116/1.587358
X. Qiu, R.A. Dodd, J.R. Conrad, A. Chen, F.J. Worzala, Microstructural study of nitrogen-implanted Ti6Al4V alloy Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 59, pp. 951- 956 ,(1991) , 10.1016/0168-583X(91)95740-5
Gerard W. Malaczynski, Alaa A. Elmoursi, Aboud H. Hamdi, Xiaohong Qiu, High-voltage implantation facility at GM Research international conference on ion implantation technology. ,vol. 74, pp. 13- 17 ,(1993) , 10.1016/0168-583X(93)95007-R
K. Komvopoulos, B. Wei, S. Anders, A. Anders, I. G. Brown, Surface modification of magnetic recording heads by plasma immersion ion implantation and deposition Journal of Applied Physics. ,vol. 76, pp. 1656- 1664 ,(1994) , 10.1063/1.358516
M. Madapura, R. A. Dodd, J. R. Conrad, D. Plantz, F. J. Worzala, Structure and property correlation of plasma source ion implanted layers in Monel K‐500 alloy Journal of Vacuum Science and Technology. ,vol. 8, pp. 2169- 2172 ,(1990) , 10.1116/1.577035
Shamim M Malik, K Sridharan, RP Fetherston, A Chen, and JR Conrad, Overview of plasma source ion implantation research at University of Wisconsin–Madison Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 12, pp. 843- 849 ,(1994) , 10.1116/1.587357
G.A. Collins, R. Hutchings, K.T. Short, J. Tendys, X. Li, M. Samandi, Nitriding of austenitic stainless steel by plasma immersion ion implantation Surface and Coatings Technology. ,vol. 74-75, pp. 417- 424 ,(1995) , 10.1016/0257-8972(95)08370-7