Silicon Oxide Dissolution in Fluorohydrogenates Ionic Liquid

Eugene A. Irene, 忠弘 大見, Gregg S. Higashi, Surface chemical cleaning and passivation for semiconductor processing Materials Research Society. ,(1993)

Xiaoge Gregory Zhang, Electrochemistry of silicon and its oxide ,(2001)

弘幸 大野, Electrochemical aspects of ionic liquids Wiley Interscience. ,(2005)

Peter Wasserscheid, Thomas Welton, Ionic Liquids in Synthesis ,(2002)

John S. Judge, A Study of the Dissolution of SiO2 in Acidic Fluoride Solutions Journal of The Electrochemical Society. ,vol. 118, pp. 1772- 1775 ,(1971) , 10.1149/1.2407835

Kenneth N. Marsh, Alex Deev, Alex C-T. Wu, Emma Tran, A. Klamt, Room temperature ionic liquids as replacements for conventional solvents – A review Korean Journal of Chemical Engineering. ,vol. 19, pp. 357- 362 ,(2002) , 10.1007/BF02697140

Hsin-Liang Huang, Yan Jyun Chen, Speciation of copper–humic acid in zeolite Y during extraction with a RTIL Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment. ,vol. 619, pp. 119- 121 ,(2010) , 10.1016/J.NIMA.2010.02.127

Boris Shvartsev, Gil Cohn, Hila Shasha, Rüdiger-A. Eichel, Yair Ein-Eli, Reference electrode assembly and its use in the study of fluorohydrogenate ionic liquid silicon electrochemistry Physical Chemistry Chemical Physics. ,vol. 15, pp. 17837- 17845 ,(2013) , 10.1039/C3CP52661E

Hugo E. Gottlieb, Vadim Kotlyar, Abraham Nudelman, NMR Chemical Shifts of Common Laboratory Solvents as Trace Impurities. Journal of Organic Chemistry. ,vol. 62, pp. 7512- 7515 ,(1997) , 10.1021/JO971176V

D. Martin Knotter, Etching Mechanism of Vitreous Silicon Dioxide in HF-Based Solutions Journal of the American Chemical Society. ,vol. 122, pp. 4345- 4351 ,(2000) , 10.1021/JA993803Z