A liquid-xenon-jet laser-plasma x-ray and EUV source
作者： B HANSSON , L RYMELL , M BERGLUND , H HERTZ
DOI: 10.1016/S0167-9317(00)00401-9
关键词:
摘要: We describe a laser-plasma soft-x-ray source based on cryogenic-xenon liquid-jet target. The is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray (PXL). Absolute calibrated spectra in the 1-2 nm range uncalibrated 9-15 are obtained using free-standing transmission grating CCD-detector.
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