Microstructure of plasma‐deposited a‐Si : H films

作者: J. C. Knights , R. A. Lujan

DOI: 10.1063/1.91086

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摘要: Using transmission and scanning electron microscopy, it is shown that plasma deposition of amorphous silicon hydrogen films from silane or silane/argon mixtures proceeds via nucleation growth islands average lateral dimensions ∼100 A. If these do not coalesce into a homogeneous film, subsequent produces columnar morphology with low‐density interstitial regions. There strong correlation between the structure presence nonradiative recombination centers.

参考文章(7)
G. Lucovsky, R. J. Nemanich, J. C. Knights, Structural interpretation of the vibrational spectra ofa-Si: H alloys Physical Review B. ,vol. 19, pp. 2064- 2073 ,(1979) , 10.1103/PHYSREVB.19.2064
Frank L. Galeener, Optical Evidence for a Network of Cracklike Voids in Amorphous Germanium Physical Review Letters. ,vol. 27, pp. 1716- 1719 ,(1971) , 10.1103/PHYSREVLETT.27.1716
K. Chopra, Julius Klerrer, Thin film phenomena ,(1969)
John A. Thornton, Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings Journal of Vacuum Science and Technology. ,vol. 11, pp. 666- 670 ,(1974) , 10.1116/1.1312732
R. A. Street, J. C. Knights, D. K. Biegelsen, Luminescence studies of plasma-deposited hydrogenated silicon Physical Review B. ,vol. 18, pp. 1880- 1891 ,(1978) , 10.1103/PHYSREVB.18.1880
J.C. Knights, G. Lucovsky, R.J. Nemanich, Defects in plasma-deposited a-Si: H Journal of Non-crystalline Solids. ,vol. 32, pp. 393- 403 ,(1979) , 10.1016/0022-3093(79)90084-X
Á. Barna, P. B. Barna, G. Radnócute;czi, L. Tóth, P. Thomas, A comparative study of the structure of evaporated and glow discharge silicon Physica Status Solidi (a). ,vol. 41, pp. 81- 84 ,(1977) , 10.1002/PSSA.2210410107