作者: J. C. Knights , R. A. Lujan
DOI: 10.1063/1.91086
关键词:
摘要: Using transmission and scanning electron microscopy, it is shown that plasma deposition of amorphous silicon hydrogen films from silane or silane/argon mixtures proceeds via nucleation growth islands average lateral dimensions ∼100 A. If these do not coalesce into a homogeneous film, subsequent produces columnar morphology with low‐density interstitial regions. There strong correlation between the structure presence nonradiative recombination centers.