作者: Khoi A. Phan , Bharath Rangarajan
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摘要: The present invention relates to a method of eliminating microbubbles associated with developer solution. includes depositing the solution over an exposed photoresist film which overlies substrate and agitating using waves. agitation causes exit reduces defects previously therewith. In addition, system for is disclosed. apparatus applying system. operably coupled agitates waves,