Mechanism and Kinetics of Hexamethyldisilazane Reaction with a Fumed Silica Surface

作者: V.M. Gun'ko , M.S. Vedamuthu , G.L. Henderson , J.P. Blitz

DOI: 10.1006/JCIS.2000.6934

关键词:

摘要: Quantum chemical calculations of the reaction hexamethyldisilazane with silica indicates a two-step mechanism. The first, rate-determining step results in trimethylsilylation surface silanol and formation trimethylaminosilane. second involves trimethylaminosilane reactive intermediate to form trimethylsilyl species ammonia. This mechanism was applied analyze data kinetics fumed using custom interactive software. Both extent loss from toluene solution were monitored by FT-IR spectroscopy as function time. Data analysis that under conditions studied is adsorption rate limited. entire can be explained terms non-hydrogen-bonded silanols, though hydrogen-bonded silanols act sites.

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