Laser generation of XeCl exciplex molecules in a longitudinal repetitively pulsed discharge in a Xe – CsCl mixture

摘要: By using the previously developed kinetic model, we have carried out simulations to study possibility of laser generation XeCl exciplex molecules in working medium based on a mixture Xe with CsCl vapours, excited by longitudinal repetitively pulsed discharge. The formation mechanism this is fundamentally different from mechanisms traditional mixtures lasers. conditions that make possible are discussed. For these conditions, allowance for available specific experimental discharge excitation, obtained calculated dependences power and efficiency reflectivity mirrors cavity.