Structure and corrosion behavior of sputter deposited cerium oxide based coatings with various thickness on Al 2024-T3 alloy substrates

摘要: Abstract Cerium oxide based coatings from ∼100 to ∼1400 nm in thickness were deposited onto Al 2024-T3 alloy substrates by magnetron sputtering of a 99.99% pure CeO2 target. The crystallite size increased 15 nm 46 nm as the coating ∼100 nm ∼1400 nm. inhomogeneous lattice strain 0.36% 0.91% for ∼900 nm thick and slightly decreased 0.89% coating. highest adhesion strength was ∼210 nm coating, due continuous film coverage low internal stress. Electrochemical measurements indicated that sputter crystalline acted physical barriers provide good cathodic inhibition alloys saline solution. coated sample had best corrosion performance resistance two orders magnitude lowered current density 30 times compared bare substrates. reduced defects exposed surface, along with suppressed charge mobility, likely accounts improved ∼900 nm. part an increase porosity decrease strength.