Metal-oxide lift-off for optimized heterointegration of photonic circuits

摘要: Crystal ion slicing can fabricate microns-thin-films from bulk, single-crystal metal oxides, which are important materials in optical, microwave, and electrical applications. These thin-films maintain properties, very difficult to achieve other thin-film technologies such as epitaxial growth. In this paper, ion-slicing technique is reviewed briefly a process, material, device perspective. The demonstrated applications integrated optics listed, along with complete reference related publications.