Pattern inspection apparatus and method

摘要: A pattern inspection apparatus is used for inspecting a fine pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and photomask (reticle) the or which are fabricated based on data fabricating design data. The includes reference generation device configured to generate represented by one more lines, comprising of line segment curve, from data, an image to-be-inspected, detecting detect edge inspect to-be-inspected comparing with lines pattern.