Network formation of a phenyl vinyl ketone copolymer with 4-vinylbenzil and its photodecrosslinking in films

摘要: The irradiation (A > 400 nm) in air of a copolymer phenyl vinyl ketone with 4-vinylbenzil (VBZ) containing 1.5 wt % VBZ structural units film, followed by the thermal decomposition resulting pendant benzoyl peroxide groups, leads to crosslinking. subsequent crosslinked polymer at 366 nm results cleavage poly(phenyl ketone) chain between junction points network through Norrish type II reaction. Therefore, ketone-co-4-vinylbenzil) represents novel photoresist based on decrosslinking. process involves three steps: photogeneration peroxide, crosslinking its decomposition, and photodecrosslinking network. This material provides positive-tone images after UV exposure 330 development an organic medium such as isopropyl methyl ketone.