High magnetoresistance permalloy films deposited on a thin NiFeCr or NiCr underlayer
作者： W.-Y. Lee , M. F. Toney , P. Tameerug , E. Allen , D. Mauri
DOI: 10.1063/1.372908
关键词:
摘要: Significantly enhanced anisotropic magnetoresistance (MR) in permalloy (Ni0.81Fe0.19) films deposited on a thin (Ni0.81Fe0.19)1−xCrx or Ni1−xCrx underlayer is reported. The maximum ΔR/R enhancement was observed using the with x≈0.44 at an optimum thickness of ≈30–45 A, depending deposition technique. An 75%–150% for 45–430 A thick films, compared to without this underlayer. attributed decrease resistivity ρ and increase Δρ film due formation large (111) textured crystal grains underlayer, as revealed by x-ray diffraction results obtained synchrotron radiation.
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