Vapor deposition apparatus

作者: Ryozo Hiraga , Keijiro Nishida , Ichiro Komatsubara , Tomomasa Nakano , Mitsuo Kakei

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摘要: An apparatus for continuously processing articles includes a pre-heating chamber confining vacuum therein provided with four openings by which an entrance chamber, two depositing and exit communicate therewith individually. Each of the is gate valve mounted covering openings, particularly chambers serving to maintain in at predetermined level while feeding unprocessed removing processed from such manner that not affected ambient atmosphere. The comprises cylindrical housing water-wheel-like conveyor having means receiving holding deposition jigs carrying as optical elements intermittently rotated advance through chamber. This feature invention facilitates reduction heating time per jig. In addition, automatic inversion jig half revolution serves facilitate successive applications thin film coating on opposite surfaces without breaking insuring each treated identically produce uniform properties coating.

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