Determination of the linear attenuation range of electron transmission through film specimens.
作者： Fang Wang , Hai-Bo Zhang , Meng Cao , Ryuji Nishi , Akio Takaoka
DOI: 10.1016/J.MICRON.2010.05.014
关键词:
摘要: We have investigated the linear attenuation range of electron transmission through film specimens and its dependence on energy, acceptance half-angle a detector or an objective aperture, specimen properties, in scanning microscope (STEM) conventional (TEM). Electron bright-field mode was calculated by Monte Carlo simulation scattering, thickness then determined least squares fit. The corresponding shown to increase with energy half-angle, although it decreased atomic number materials. Under condition 300 kV STEM 3 MV ultra-high voltage (ultra-HVEM), could extend several microns for light materials, this validated experimental data ultra-HVEM. presented results can be helpful accurately measuring mass from transmission, estimating deviation linearity when tilting tomography.
elsevier.com
sci-hub.se 参考文章(39)
Peter Ercius, Matthew Weyland, David A. Muller, Lynne M. Gignac, Three-dimensional imaging of nanovoids in copper interconnects using incoherent bright field tomography Applied Physics Letters. ,vol. 88, pp. 243116- ,(2006) , 10.1063/1.2213185
Fang Wang, Hai-Bo Zhang, Meng Cao, Ryuji Nishi, Akio Takaoka, Multiple scattering effects of MeV electrons in very thick amorphous specimens. Ultramicroscopy. ,vol. 110, pp. 259- 268 ,(2010) , 10.1016/J.ULTRAMIC.2009.12.013
Zachary H. Levine, Theory of bright-field scanning transmission electron microscopy for tomography Journal of Applied Physics. ,vol. 97, pp. 033101- ,(2005) , 10.1063/1.1828604
Haibo Zhang, Akio Takaoka, Alteration of magnification and image rotation in tilt series of electron microscopic images Measurement Science and Technology. ,vol. 10, ,(1999) , 10.1088/0957-0233/10/1/013
A.P. Balashov, D.V. Kostin, E.T. Shipatov, PENETRATION OF FAST ELECTRONS IN LAYERED TARGETS Nuclear Instruments & Methods in Physics Research Section B-beam Interactions With Materials and Atoms. ,vol. 155, pp. 25- 35 ,(1999) , 10.1016/S0168-583X(99)00237-2
I. Pozsgai, Mass thickness determination and microanalysis of thin films in the TEM--revisited. Ultramicroscopy. ,vol. 107, pp. 191- 195 ,(2007) , 10.1016/J.ULTRAMIC.2006.07.005
X. Sun, Z. J. Ding, Q. R. Pu, H. M. Li, Z. Q. Wu, W. Q. Gu, K. W. Peng, G. J. Wu, F. A. Zhang, N. K. Kang, Monte Carlo simulation of electron transmission through the scattering masks with angular limitation for projection electron lithography Journal of Applied Physics. ,vol. 92, pp. 3641- 3646 ,(2002) , 10.1063/1.1505679
Fang Wang, Hai-Bo Zhang, Meng Cao, Ryuji Nishi, Akio Takaoka, Image quality of microns-thick specimens in the ultra-high voltage electron microscope. Micron. ,vol. 41, pp. 490- 497 ,(2010) , 10.1016/J.MICRON.2010.01.010
Elmar Zeitler, Gunter F. Bahr, A Photometric Procedure for Weight Determination of Submicroscopic Particles Quantitative Electron Microscopy Journal of Applied Physics. ,vol. 33, pp. 847- 853 ,(1962) , 10.1063/1.1777179
G. Soum, A. Mousselli, F. Arnal, P. Verdier, Etude de la transmission et de la rétrodiffusion d'électrons d'énergie 0,05 à 3 MeV dans le domaine de la diffusion multiple Revue de Physique Appliquée. ,vol. 22, pp. 1189- 1209 ,(1987) , 10.1051/RPHYSAP:0198700220100118900