Sputtering of freestanding metal nanocrystals

作者: T.T. Järvi , K. Nordlund

DOI: 10.1016/J.NIMB.2011.01.034

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摘要: Abstract The sputtering mechanisms of nanocrystals are interest both from basic science and application development points view. Since the surface-to-volume ratio is huge compared to normal bulk matter, one could expect enhanced yields, indeed simulations experiments show yields which clearly larger than those for flat targets. We present a simple analytical model nanocrystals, apply it two different kinds irradiation, 25 keV Ga 200 keV Ar irradiation 1–15 nm diameter Au nanocrystals. predicts in good agreement with molecular dynamics experiments.

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