Photosensitive polysilazane composition, method of forming pattern therefrom, and method of burning coating film thereof

摘要: A positive photosensitive polysilazane composition which comprises: a modified polysilsesquiazane having basic structural units represented by the general formula -[SiR6(NR7)1.5]-, containing other -[SiR62NR7]- and/or [SiR63(NR7)0.5]- in an amount of 0.1 to 100 mol% based on units, and number-average molecular weight 100,000 (in formulae, R?6 R7? each independently represents hydrogen, C?1-3? alkyl, or (un)substituted phenyl); photo-acid generator. It preferably contains water-soluble compound as shape stabilizer. The is applied substrate pattern-wise exposed light. coating film moistened then developed with aqueous alkali solution. resultant pattern wholly light, subsequently again, burned. Thus, fine silica-based ceramic has satisfactory properties suitable interlayer dielectric formed short time.