Influence of oxygen and argon plasma treatments on the chemical structure and redox state of oxide covered iron

摘要: Abstract The paper reveals structural changes of the iron surface during plasma oxidation in an oxygen glow discharge. For this purpose, in-situ set-up which combines IR-spectroscopy under grazing incidence and quartz crystal micro weighing was used. A Scanning Kelvin Probe used to measure influence discharge on electronic properties oxide surface. initiated by a low power audio frequency voltage source. results show that is already covered natural layer leads effective removal organic contaminations increased thickness about 5 6 nm. In agreement with spectroscopic data, Voltapotential measurements depleted Fe 2+ states. structure additionally grown most likely be γ-Fe 2 O 3 . This means n-semiconducting are changed. Within subsequent argon discharge, 3+ again reduced illustrates importance consideration while structuring metals usefulness measurement reveal semiconducting layers.