Some effects of stress in Goss-oriented silicon-iron

作者: A. Moses , P. Phillips

DOI: 10.1109/TMAG.1978.1059884

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摘要: The magnetic characteristics of Goss-oriented 3% silicon-iron are dependent to a large extent on mechanical stress. This paper describes some effects applying orthogonal planar stresses single samples commercial silicon-iron. Tensile or compressive up 10 MN/m2were applied simultaneously along and perpendicular the rolling direction material was magnetized either sinusoidally 1.7 T. Power loss magnetostriction were measured under various stress conditions. dependence properties did not vary with flux density in tested. Orthogonal opposite signs always caused degradation whereas same sign usually improved characteristics. Previously, it has been shown that transverse had effect as longitudinal half its value. In these experiments this found be case possibly because elastic steel different due complex coating stresses.

参考文章(4)
W D Corner, J J Mason, The effect of stress on the domain structure of Goss textured silicon-iron British Journal of Applied Physics. ,vol. 15, pp. 709- 718 ,(1964) , 10.1088/0508-3443/15/6/315
A. Basak, A.J. Moses, Influence of stress on rotational loss in silicon iron Proceedings of the Institution of Electrical Engineers. ,vol. 125, pp. 165- 168 ,(1978) , 10.1049/PIEE.1978.0045
A. J. Moses, Effects of stresses on magnetic properties of silicon-iron laminations Journal of Materials Science. ,vol. 9, pp. 217- 222 ,(1974) , 10.1007/BF00550944
P.J. Banks, E. Rawlinson, Dynamic magnetostriction and mechanical strain in oriented 3% silicon-iron sheet subject to combined longitudinal and transverse stresses Proceedings of the Institution of Electrical Engineers. ,vol. 114, pp. 1537- 1546 ,(1967) , 10.1049/PIEE.1967.0293