作者: Yoshitaka Nishino , Alan R. Krauss , Yuping Lin , Dieter M. Gruen
DOI: 10.1016/0022-3115(95)00194-8
关键词:
摘要: The initial oxidation of zirconium and Zircaloy-2 with oxygen water vapor has been investigated at room temperature Auger electron X-ray photoelectron spectroscopies. Three suboxides Zr2O, ZrO Zr2O3 accompanied by the oxide ZrO2 are formed on surfaces in both atmospheres. Formation starts about 0.2–0.4 L (1 ≡ 10−6 Torr s) exposure. rate is slightly larger than that Zircaloy-2. In case low pressure exposure (< 10 L), amounts Zircaloy-2, since dissociation H2O molecules proceeds more easily former. to form after a 1.0 exposure, its formation ambience much smaller oxygen. An average composition ZrO1.50–1.53 film thickness 2.3 nm obtained for exposed 30 oxygen, 1.3 run thick Zr1.06