Two-dimensional texture and sheath evolution in metal plasma immersion ion implantation
作者： S. Mändl , G. Thorwarth , B. Stritzker , B. Rauschenbach
DOI: 10.1016/J.SURFCOAT.2005.01.115
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摘要: Abstract The spatial texture evolution and variation across a sample holder (6 cm diameter) was investigated for titanium nitride thin films deposited by metal plasma immersion ion implantation deposition (MePIIID). With increasing pulse voltage from −1 to −10 kV frequency, transition of the [111] via [220] [200] observed. Here, product frequency is determining texture, with slight dependence fluence per on as minor correction. Near edge samples, tilt crystallites For high frequencies, an equilibrium position observed, while gradual decrease lower frequencies present. Apparently, orientation grains along incidence direction dynamic process requiring certain minimum energy input complete transformation.
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