Study on organosilicon positive resist. I. Syntheses and characterization of silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups

摘要: Silsesquioxane, siloxane, and silmethylene polymers with phenolic hydroxy groups were prepared in order to obtain alkali-soluble organosilicon polymers. These have structures which the phenol moieties are separated by one carbon from silicon. The protected as methoxy polymerization processes, then changed into a reaction trimethylsilyl iodide followed alcoholysis. In course of discussion on characteristics these polymers, silsesquioxane is found possess excellent properties for matrix resins alkalidevelopable resists, such O2RIE resistance heat resistance.