作者: Dae-Eun Kim , LiYu Lin , Jung-Eun Lee
DOI: 10.9725/KSTLE.2008.24.2.077
关键词:
摘要: In this work, ramp loading scratch method was used to evaluate the characteristics of HDD media and ZnO thin films. Commercially available films grown on silicon(100) substrate by sol-gel were used. As for films, effects annealing temperature after film deposition process also investigated. A custom built tester specimen under a condition. The track formed measured optical microscope Atomic Force Microscopy (AFM). wear depth width assess Media results showed that annealed at had best resistance property. Also, overall better than