Growth Mechanisms and the Effects of Deposition Parameters on the Structure and Properties of High Entropy Film by Magnetron Sputtering.
作者： Yanxia Liang , Peipei Wang , Yufei Wang , Yijia Dai , Zhaoyi Hu
DOI: 10.3390/MA12183008
关键词:
摘要: Despite intense research on high entropy films, the mechanism of film growth and influence key factors remain incompletely understood. In this study, films consisting five elements (FeCoNiCrAl) with columnar nanometer-scale grains were prepared by magnetron sputtering. The mechanism, including formation amorphous domain, equiaxial nanocrystalline structure crystal was clarified analyzing microstructure in detail. Besides, impacts important deposition parameters substrate temperature, powder loaded target, orientation grain size morphology, phase structure, crystallinity elemental uniformity revealed. mechanical properties various features investigated nanoindentation. With optimized microstructure, deposited at 350 °C using a power 100 W exhibits highest hardness 11.09 GPa. Our findings not only help understanding mechanisms during deposition, but also provide guidance manufacturing other novel films.
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