Amorphous zirconium-nickel films formed by solid state reactions
作者： B.M. Clemens , W.L. Johnson , R.B. Schwarz
DOI: 10.1016/0022-3093(84)90643-4
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摘要: Abstract We have formed an amorphous zirconium-nickel phase by annealing vapor deposited crystalline layers of elemental zirconium and nickel. Auger depth profiling x-ray diffraction been used to monitor the reaction. The thermodynamics process is explained in terms a metastable free energy diagram which reflects large negative heat mixing between formation layer occurs via diffusion limited reaction occurring at interface.
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U. Gösele, K. N. Tu, Growth kinetics of planar binary diffusion couples: ’’Thin‐film case’’ versus ’’bulk cases’’ Journal of Applied Physics. ,vol. 53, pp. 3252- 3260 ,(1982) , 10.1063/1.331028
A.D. Le Claire, Solute diffusion in dilute alloys Journal of Nuclear Materials. pp. 70- 96 ,(1978) , 10.1016/0022-3115(78)90237-4
R. W. Vook, Structure and growth of thin films International Materials Reviews. ,vol. 27, pp. 209- 245 ,(1982) , 10.1179/IMR.1982.27.1.209