Control system, positioning system, lithographic apparatus, control method, device manufacturing method and control program
作者： Jan Van Eijk , Wilhelmus Henricus Theodorus Maria Aangenent , Marinus Maria Johannes Van De Wal , Jeroen Johannes Theodorus Hendrikus De Best
DOI:
关键词:
摘要: A control system for a positioning system, driven object, e.g. in lithographic apparatus, N dimensions has M sensors, where M>N. transformation module converts the measurements by sensors into positional estimate taking account compliance of object.
lens.org 参考文章(20)
Dick Antonius Hendrikus Laro, Yim-Bun Patrick Kwan, Method for controlling a motion of optical elements in lithography systems ,(2014)
Koichi Sakata, Hiroshi Fujimoto, Takeshi Ohtomo, Kazuaki Saiki, Drive control method, drive control apparatus, stage control method, stage control apparatus, exposure method, exposure apparatus and measuring apparatus ,(2008)
Christopher Charles Ward, Mark Henricus Wilhelmus Van Gerven, Bram Paul Theodoor Van Goch, Lithographic apparatuses and methods for compensating for eigenmode coupling ,(2013)
Jan Van Eijk, Yang-Shan Huang, Johannes Petrus Martinus Bernardus Vermeulen, Sven Antoin Johan Hol, Hans Butler, Lithographic apparatus comprising a substrate table ,(2012)
Sascha Bleidistel, Juergen Fischer, Ulrich Schoenhoff, Arrangement for actuating an element in a microlithographic projection exposure apparatus ,(2012)
Peter C. Kochersperger, Daniel N. Galburt, Lithographic tool with dual isolation system and method for configuring the same ,(2002)
Emiel Jozef Melanie Eussen, Marcel François Heertjes, Henrikus Herman Marie Cox, Ramidin Izair Kamidi, Engelbertus Antonius Fransiscus Van Der Pasch, Ronald Casper Kunst, Mark Constant Johannes Baggen, Stage system and lithographic apparatus comprising such stage system ,(2008)
Jan Van Eijk, Engelbertus Antonius Fransiscus Van Der Pasch, Johannes Petrus Martinus Bernardus Vermeulen, Erik Roelof Loopstra, System for detecting motion, lithographic apparatus and device manufacturing method ,(2012)
Hirohito Ito, Positioning apparatus, exposure apparatus, and device manufacturing method ,(2011)
Hans Butler, Marinus Maria Johannes Van De Wal, Jeroen Johan Maarten Van De Wijdeven, Ramidin Izair Kamidi, Martijn Houkes, Controller, Lithographic Apparatus, Method of Controlling the Position of an Object and Device Manufacturing Method ,(2011)