作者: H. Wang , L.Z. Ouyang , C.H. Peng , M.Q. Zeng , C.Y. Chung
DOI: 10.1016/J.JALLCOM.2003.09.019
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摘要: Abstract MgNi/Pd multilayer thin films were deposited on Ni substrate by direct current (dc) magnetron sputtering using a dual-target, each MgNi layer being 40 nm and Pd 16 nm in thickness. The total thickness of the film is about 1.7 μm. X-ray diffraction scanning electron microscopy analysis revealed that microstructure amorphous and/or nanocrystalline fine grained crystalline with no preferential orientation. A pressure–composition–isotherm (PCI) measurement proved hydrogen absorption content reached to 4.6 mass% at room temperature desorption 3.4 mass% hydrogen. show an interesting behavior discharge capacity maximal value 505 mAh/g.