作者: Bret W. Adams , David Datong Huo , John Jarvis
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摘要: Apparatus, positioned at an inlet port to a pump, for shielding the pump from process chamber of semiconductor wafer processing system, where apparatus has controllably variable effective throughput area, and method electrically controlling size area. Specifically, is controllable restrictor shield supported by actuator, having first area second typically less than The directly responsive electric signal that controls actuator.