MOCVD and Physicochemical Characterization of (HfO2)x(Al2O3)1‐x Thin Films
作者： Tamara P. Smirnova , Mikhail S. Lebedev , Natalia B. Morozova , Peter P. Semyannikov , Ksenia V. Zherikova
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摘要: Investigation of the thermal behavior Hf(dpm)4 vapor in vacuum is carried out. An approach for obtaining films (HfO)x(Al2O3)1-x alloys developed. The use a source containing mixture two precursors differing from each other volatility, notably (dpm = dipivaloylmethanate, 2,2,6,6-tetramethylheptane-3,5-dionate) and Al(acac)3 (acac = pentane-2,4-dionate), allows us to employ possibilities combinatorial chemistry, obtain analyze number different compositions alloys. Film characterization performed using set analytical methods. character Al Hf distributions across film thickness, depending on their content source, investigated. laser null ellipsometry determine distribution refractive index thickness film. A comparison ellipsometric data with X-ray photoelectron spectroscopy (XPS) shows that variation reproduces chemical composition thickness. uniform elements observed cases when separated sources are used. structure depends molar fraction Al2O3 For Al ≥ 30 at.-% amorphization occurs.
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