Method for producing a solar cell

作者: Katsuhiko Shirasawa , Yosuke Inomata

DOI:

关键词:

摘要: A substrate processing apparatus that roughens the surface of a through dry etching method by covering to be processed with plate provided number opening portions. The is portions in such manner an open area ratio on peripheral side smaller than central portion when viewed plane. It thus possible form textures efficiently and homogenously, which turn makes it manufacture highly efficient solar cells or like at low cost.

参考文章(68)
John L. Cain, Michael E. Costabile, William P. Marsh, Michael P. Relue, Method of processing a semiconductor wafer ,(1995)
Toshiyuki Sameshima, Masaki Hara, Naoki Sano, Setsuo Usui, Plasma system comprising hollow mesh plate electrode ,(1992)
James Louis Speidell, James Mckell Edwin Harper, Jerome John Cuomo, Harold Richard Kaufman, Programmable ion beam patterning system ,(1985)
Norbert Legrand, Erwin Fischhaber, Herbert Fischer, Hans Weber, Johannes Schroder, Thomas Uihlein, Strip coatings for metal components of drive units and their process of manufacture ,(1995)
Mikitaka Itoh, Yasuyuki Inoue, Takashi Saida, Yasuhiro Hida, Silica-based optical waveguide circuit and fabrication method thereof ,(2002)
Masahiro Hatakeyama, Takao Kato, Katsunori Ichiki, Yotaro Hatamura, Masayuki Nakao, Fabrication method with energy beam ,(1996)