A Study on the expectation of residual layer thickness in roller pressing imprint process

摘要: In order to apply nano imprint technology in large area process, roller pressing is promising because of its low cost and high productivity. When mold by roller, liquid resin locally squeezed between substrate. this study, the main focus understand which process parameter affects residual layer. To do this, a simple analytical model was introduced. Especially, we consider aspect ratio patterns as essential cause variation thickness equation. As result, when pattern increases, layer also increases. conclusion, show that uniformity could be accomplished control velocity force process.