A Mathematical Model of the Coupled Fluid Mechanics and Chemical Kinetics in a Chemical Vapor Deposition Reactor
作者： Michael E. Coltrin , Robert J. Kee , James A. Miller
DOI: 10.1149/1.2115598
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摘要: … In this paper we report the results of our studies on the reactive deposition of the oxides of silicon (SiO~). Films of SiO~ (0 ~< x ~< 2) were synthesized at high rates onto substrates held …
ecsdl.org参考文章(1)
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