Abrasion resistance of ZnO and ZnO:Al films on glass substrates by atomic layer deposition
作者： R. Pietruszka , B.S. Witkowski , S. Zimowski , T. Stapinski , M. Godlewski
DOI: 10.1016/J.SURFCOAT.2017.04.007
关键词:
摘要: Abstract Scratches and constant abrasive wear can result in zinc oxide (ZnO) aluminum doped (ZnO:Al) layers that render many devices impracticable to use. Currently, the ZnO ZnO:Al are widely used as transparent conductivity (TCO). The top and/or bottom electrodes based on were organic light-emitting diodes (OLED), perovskite solar cells order replace expensive indium tin (ITO). Consequently, knowledge of frictional properties layer is a necessity for scientists. In this study, tribological was formed by Low Temperature Atomic Layer Deposition (LT ALD) method investigated. ALD-layers (ZnO ZnO:Al) deposited glass substrates pre-selected conditions achieve films appropriate application photovoltaics. results indicate good adhesion substrate. abraded during friction with Al 2 O 3 ball their intensity depend hardness film/substrate system. coefficient film reached value 0.1 higher than equal 0.08. these compared those reported bulk sputtering.
sci-hub.se 参考文章(37)
Yongdong Xu, Xiu-Tian Yan, Chemical Vapour Deposition: An Integrated Engineering Design for Advanced Materials ,(2010)
Zhimin Chai, Xinchun Lu, Dannong He, Friction mechanism of zinc oxide films prepared by atomic layer deposition RSC Advances. ,vol. 5, pp. 55411- 55418 ,(2015) , 10.1039/C5RA05355B
Neil P. Dasgupta, Sebastian Neubert, Wonyoung Lee, Orlando Trejo, Jung-Rok Lee, Fritz B. Prinz, Atomic Layer Deposition of Al-doped ZnO Films: Effect of Grain Orientation on Conductivity Chemistry of Materials. ,vol. 22, pp. 4769- 4775 ,(2010) , 10.1021/CM101227H
Benjamin G. Lee, Shuo Li, Guillaume von Gastrow, Marko Yli-Koski, Hele Savin, Ville Malinen, Jarmo Skarp, Sukgeun Choi, Howard M. Branz, Excellent passivation and low reflectivity with atomic layer deposited bilayer coatings for n-type silicon solar cells Thin Solid Films. ,vol. 550, pp. 541- 544 ,(2014) , 10.1016/J.TSF.2013.10.166
M. Godlewski, E. Guziewicz, G. Łuka, T. Krajewski, M. Łukasiewicz, Ł. Wachnicki, A. Wachnicka, K. Kopalko, A. Sarem, B. Dalati, ZnO layers grown by Atomic Layer Deposition: A new material for transparent conductive oxide Thin Solid Films. ,vol. 518, pp. 1145- 1148 ,(2009) , 10.1016/J.TSF.2009.04.066
S. O. Kucheyev, J. E. Bradby, J. S. Williams, C. Jagadish, M. V. Swain, Mechanical deformation of single-crystal ZnO Applied Physics Letters. ,vol. 80, pp. 956- 958 ,(2002) , 10.1063/1.1448175
S.J. Pearton, D.P. Norton, K. Ip, Y.W. Heo, T. Steiner, Recent progress in processing and properties of ZnO Superlattices and Microstructures. ,vol. 34, pp. 3- 32 ,(2003) , 10.1016/S0749-6036(03)00093-4
Markku Leskelä, Mikko Ritala, Atomic layer deposition (ALD): from precursors to thin film structures Thin Solid Films. ,vol. 409, pp. 138- 146 ,(2002) , 10.1016/S0040-6090(02)00117-7
Miin-Jang Chen, Jer-Ren Yang, Makoto Shiojiri, ZnO-based ultra-violet light emitting diodes and nanostructures fabricated by atomic layer deposition Semiconductor Science and Technology. ,vol. 27, pp. 074005- ,(2012) , 10.1088/0268-1242/27/7/074005
Aravind Kumar Chandiran, Mojtaba Abdi-Jalebi, Mohammad K. Nazeeruddin, Michael Grätzel, Analysis of electron transfer properties of ZnO and TiO2 photoanodes for dye-sensitized solar cells. ACS Nano. ,vol. 8, pp. 2261- 2268 ,(2014) , 10.1021/NN405535J