Micro-lithographic projection exposure system for manufacturing micro-structured component, has refractive optical element whose absorption coefficient for projection of light is changed due to effect of induced absorption
作者： Holger Walter
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摘要: The system (10) has a transmission filter provided with refractive optical element which is arranged in an path through projection light passed. An irradiation set to irradiate induction radiation variable regions of the element. absorption coefficient for changed due effect induced absorption. made calcium fluoride, barium fluoride or magnesium and incorporated yttrium chlorine.
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