Subwavelength lithography and its potential impact on design and EDA
作者： Andrew B. Kahng , Y. C. Pati
关键词:
摘要: This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in interface between layout design manufacturability. We review control process effects by proximity correction (OPC) phase-shifting masks (PSM), then focus on OPC PSM synthesis verification methodologies. Our discussion addresses necessary changes design-to-manufacturing flow, including infrastructure development mask communities, evolution methodology, opportunities research physical areas EDA.
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