Method for supplying deposition material, method for producing substrate, control device, and deposition device

作者: Nobuyuki Shigeoka , Ryuta Yamaguchi , Tetsuya Goto

DOI:

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摘要: Provided is a method for supplying deposition material including heating step of and evaporating accommodated in accommodating section which the accommodated, supply into by feeding melting solid phase toward melted section, state detection detecting after step.

参考文章(19)
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Ihara Hirohiko, Awata Hideaki, Emura Katsuji, Yoshida Kentaro, VACUUM VAPOR-DEPOSITION APPARATUS, AND METHOD FOR OPERATING THE APPARATUS ,(2007)
Nakahara Hisanao, Nagamine Tsuneo, Iguchi Masao, Suzuki Fumihito, METHOD AND DEVICE FOR SUPPLYING VAPORIZATION MATERIAL IN DRY PLATING ,(1990)