Reaction of potassium with thin epitaxial NiO(100) films
作者： M. Schulze , R. Reissner
DOI: 10.1016/S0039-6028(02)01362-6
关键词:
摘要: Abstract Nickel is frequently used as catalyst in alkaline electrochemical systems where the metal adsorbs on oxygen electrodes. Therefore reaction of potassium with thin nickel oxide films deposited an Ag(1 0 0) surface was study by ultraviolet photoelectron spectroscopy, low-energy electron diffraction and X-ray which allows to investigate oxidation states nickel. Due deposition metallic formed oxides cannot be stoichiometric. The reacted film, whereby partially reduced oxidized. started at low temperatures finished approx. 300 K.
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